Optimization of triangular-profiled Si-grating fabrication technology for EUV and SXR applications

Anisotropic wet etching of vicinal monocrystalline Si (111)4 o wafers was used to obtain blazed gratings that are highly efficient in the soft X-ray (SXR) and extreme ultraviolet (EUV) applications. An improved experimental technology for fabrication triangular-grooved gratings, both medium-frequency (250 500 mm -1 ) high-frequency (2500 ones, is presented. The stages forming a Cr-mask grooves etching, removing nubs order smooth profile, polishing surface reduce nanoroughness have been optimized. This paper describes way simultaneously (in one process) obtaining smoothed triangular profile grating polished facets by etching. Keywords: diffraction grating, groove AFM, SEM.